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Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System
Bahaa T. Chiad,
Mohammad K. Khalaf,
Firas J. Kadhim,
Oday A. Hammadi
OALIBJ
Vol.1 No.4, July 23, 2014
DOI:
10.4236/oalib.1100650
(PDF 527K)
Atomic Force Microscopy Studies on GaAs/In Bilayers Deposited on Si (100)
Miguel Ángel Venegas,
Roberto Bernal- Correa,
Máximo López- López,
Álvaro Pulzara- Mora
Microsc. Res.
Vol.3 No.1, January 30, 2015
DOI:
10.4236/mr.2015.31002
(PDF 5971K)
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Deposition and Characterization of Multilayer DLC/BN Films
Honei Chin,
Chavin Jongwannasiri,
Shuichi Watanabe
Mater. Sci. Appl.
Vol.8 No.10, September 14, 2017
DOI:
10.4236/msa.2017.810053
(PDF 1562K)
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Cerium Oxide Film Growth Using Radio-Frequency Sputtering Process
Pao-Chi Chen,
Xiao An Wang
Mater. Sci. Appl.
Vol.11 No.5, May 11, 2020
DOI:
10.4236/msa.2020.115021
(PDF 1697K)
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Magnetron Sputtering Coating of Protective Fabric Study on Influence of Thermal Properties
Yunqi Zhai,
Xiaoxia Liu,
Li Xiao
J. Text. Sci. Technol.
Vol.1 No.3, November 30, 2015
DOI:
10.4236/jtst.2015.13014
(PDF 885K)
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