[title]
[author]
[shortEnglishNames]
[pubIssue]
DOI:
[Doi]
(PDF [paperSize]K)
[HTML] [XML]
Back
Home
Submission
Articles
Journals
Book
Services
Blog
Back
Search
Menu
Sign in
Journals by Subject
Journals by Title
Search
Homogeneous Liquid-Liquid Extraction (HoLLE) of Palladium in Real Plating Wastewater for Recovery
Takeshi Kato,
Shukuro Igarashi,
Osamu Ohno,
Shotaro Saito,
Ryo Ando
J. Environ. Prot.
Vol.7 No.2, February 26, 2016
DOI:
10.4236/jep.2016.72024
(PDF 463K)
HTML
XML
Drastic Resistivity Reduction of CVD-TiO
2
Layers by Post-Wet-Treatment in HCl Solution
Satoshi Yamauchi,
Kazuhiro Ishibashi,
Sakura Hatakeyama
J. Crystn. Process Technol.
Vol.5 No.1, January 16, 2015
DOI:
10.4236/jcpt.2015.51004
(PDF 3260K)
HTML
XML
Low Resistive TiO
2
Deposition by LPCVD Using TTIP and NbF
5
in Hydrogen-Ambient
Satoshi Yamauchi,
Kazuhiro Ishibashi,
Sakura Hatakeyama
J. Crystn. Process Technol.
Vol.5 No.1, January 12, 2015
DOI:
10.4236/jcpt.2015.51003
(PDF 3637K)
HTML
XML
Low Pressure Chemical Vapor Deposition of TiO
2
Layer in Hydrogen-Ambient
Satoshi Yamauchi,
Kazuhiro Ishibashi,
Sakura Hatakeyama
J. Crystn. Process Technol.
Vol.4 No.4, October 06, 2014
DOI:
10.4236/jcpt.2014.44023
(PDF 3061K)
HTML
XML
Low Pressure Chemical Vapor Deposition of Nb and F Co-Doped TiO
2
Layer
Satoshi Yamauchi,
Shouta Saiki,
Kazuhiro Ishibashi,
Akie Nakagawa,
Sakura Hatakeyama
J. Crystn. Process Technol.
Vol.4 No.2, April 03, 2014
DOI:
10.4236/jcpt.2014.42011
(PDF 1202K)
HTML
XML
About SCIRP
|
Sitemap
|
News
|
Jobs
Full Site
Copyright © 2020 Scientific Research Publishing Inc. All Rights Reserved.
Top
