MSA  Vol.10 No.3 , March 2019
Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering
Abstract: In this work, structural and optical properties of the TiO2 films deposited on unheated substrates by dual cathode dc unbalanced magnetron sputtering at long substrate-target distance (ds-t) were studied. Titanium dioxide (TiO2) thin films were deposited on unheated Si (110) wafers, glass slides and carbon coated copper grids at different substrate to target (ds-t) distances. The structural properties of TiO2 thin films were characterized by X-ray diffraction (XRD) and transmission electron microcopy (TEM) with selected-area electron diffraction (SAED), surface morphology using atomic force microscopy (AFM) and optical transmission spectra using a spectrophotometer. XRD results show that TiO2 films deposited at various ds-t distances have only rutile crystal structure. The crystallinity and thickness of the films increased while the roughness decreased with decreasing ds-t distance. The refractive indices of the deposited films were found to be in the range of 2.51 - 2.82 and increased with decreasing ds-t distance.
Cite this paper: Kongsri, W. , Limsuwan, S. , Chaiyakun, S. , Limsuwan, P. and Kedkaew, C. (2019) Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering. Materials Sciences and Applications, 10, 216-226. doi: 10.4236/msa.2019.103018.

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