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 MSA  Vol.9 No.9 , August 2018
Tribological Behavior of Binary B-C Films Deposited by Sputtering-PBII Hybrid System
Abstract: In this article, the authors report on the use of Radio Frequency (RF) Magnetron Sputtering combined with Plasma-Based Ion Implantation (PBII) technique to synthesize the Boron-Carbon (B-C) films. High purity of boron carbide (99.5%) disk was used as a target with an RF power of 300 W. The mixtures of Argon (Ar)-Methane (CH4) ware used as reactive gas under varying CH4 partial flow pressure at the specified range of 0 - 0.15 Pa and fixed total gas pressure and total gas flow at 0.30 Pa and 30 sccm, respectively. The effect of CH4 flow ratio on the friction coefficient of B-C films was studied. The friction coefficient of the film depended on the concentration of B. When it was 10% or lower, the coefficient decreased to 0.2 or lower. In this concentration range of B, the specific wear rate also decreased to the order of 10-7 mm3/Nm, and excellent wear resistance was displayed.
Cite this paper: Chin, H. , Yoshida, S. and Watanabe, S. (2018) Tribological Behavior of Binary B-C Films Deposited by Sputtering-PBII Hybrid System. Materials Sciences and Applications, 9, 723-731. doi: 10.4236/msa.2018.99052.
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