OJFD  Vol.6 No.4 , December 2016
Creation and Evaluation of Construction Guidelines Using CFD for Low Pressure Plasma Gas Feed-in Systems to Homogenize the Precursor Gas Flow
Abstract: The local gas-flow behavior is almost unknown for low pressure plasma systems, except parallel plate reactors for semiconductor purposes. To overcome this lack of knowledge, this study starts with the influence investigation of the gas feed-in systems technical layout on the homogeneity of the gas supply for large volume plasma enhanced chemical vapor deposition (PECVD) chambers. Computational fluid dynamics (CFD) simulations are used as a tool to determine velocity and pressure distribution inside the gas feed-in pipe as well as in the PECVD-chamber itself. The parameters varied were: flow rate, pipe length, number of holes, hole diameter and aspect ratio of the pipe section. The calculated pressure values are compared with the experimentally measured ones to validate the simulation results. An excellent conformity of the calculated and measured pressures is observed. With the aim to evaluate the homogeneity of gas distribution through the pipe holes the nonuniformity coefficient (Φ) was created. The results show the influence of each layout parameter in the homogeneity of the gas distribution. Hence in future correct technical layouts of gas feed-in systems can easily be applied. With these results construction guidelines has been formulated.
Cite this paper: Barbosa, G. , Vissing, K. and Mayer, B. (2016) Creation and Evaluation of Construction Guidelines Using CFD for Low Pressure Plasma Gas Feed-in Systems to Homogenize the Precursor Gas Flow. Open Journal of Fluid Dynamics, 6, 391-405. doi: 10.4236/ojfd.2016.64029.

[1]   Vogel, K., Westphal, N., Salz, D., Thiel, K., Wittig, L., Ciacchi, L.C. and Grunwald, I. (2015) Dental Implants Coated with a Durable and Antibacterial Film. Surface Innovations, 3, 27-38.

[2]   Paulkowski, D. and Vissing, K. (2011) Tribological Improvement of Elastomers Using Plasmapolymeric Coatings. Proceedings of Tribologie Fachtagung, Göttingen, 15/1-15/14.

[3]   Noborisaka, M., Kodama, H., Nagashima, S., Shirakura, A., Horiuchi, T. and Suzuki, T. (2012) Synthesis of Transparent and Hard SiOC(-H) Thin Films on Polycarbonate Substrates by PECVD Method. Surface and Coatings Technology, 206, 2581-2584.

[4]   Gürsoy, M. and Karaman, M. (2016) Hydrophobic Coating of Expanded Perlite Particles by Plasma Polymerization. Chemical Engineering Journal, 284, 343-350.

[5]   Yasuda, H.K. (2005) Some Important Aspects of Plasma Polymerization. Plasma Processes and Polymers, 2, 293-304.

[6]   Sankarakrishnan, R., Balasubramanian, G., Rocha-Alvarez, J.C., Du Bois, D.R., Fodor, M., Zhou, J.H., Bansal, A., Ayoub, M.A., Shaikh, S., Reilly, P., Padhi, D. and Nowak, T. (2014) Confined Process Volume PECVD Chamber. US Patent No. 8778813 B2.

[7]   Wang, Q.H., Hou, L., Yadav, S., Furuta, G., Omori, K., Choi, S.Y. and White, J.M. (2008) Gas Distribution Uniformity Improvement by Baffle Plate with Multi-Size Holes for Large Size PECVD Systems. US Patent No. 20080178807 A1.

[8]   Breitung, E., Dalakos, G., Codella, P. and Tinani-Mendleson, M. (2005) Delivery System for PECVD Powered Electrode. US Patent No. 20050022735 A1.

[9]   Rose, A.D. and Kennedy, R.M. (1988) Gas Dispersion Disk for Use in Plasma Enhanced Chemical Vapor Deposition Reactor. US Patent No. 4792378 A.

[10]   Kulkarni, A.V., Roy, S.S. and Joshi, J.B. (2007) Pressure and Flow Distribution in Pipe and Ring Spargers: Experimental Measurements and CFD Simulation. Chemical Engineering Journal, 133, 173-186.

[11]   Ahn, H., Lee, S. and Shin, S. (1998) Flow Distribution in Manifolds for Low Reynolds Number Flow. KSME International Journal, 12, 87-95.

[12]   Kim, Y.-J., Boo, J.-H., Hong, B. and Kim, Y.J. (2005) Effects of Showerhead Shapes on the Flowfields in a RF-PECVD Reactor. Surface and Coatings Technology, 193, 88-93.

[13]   Caquineau, H. and Despax, B. (1997) Influence of the Reactor Design in the Case of Silicon Nitride PECVD. Chemical Engineering Science, 52, 2901-2914.

[14]   Gad-el-Hak, M. (2006) The MEMS Handbook. Mechanical Engineering Series. CRC Taylor & Francis, Boca Raton.

[15]   Barber, R.W. and Emerson, D.R. (2002) The Influence of Knudsen Number on the Hydrodynamic Development Length within Parallel Plate Micro-Channels. Advances in Fluid Mechanics IV, 32, 207-216.

[16]   Jeerasak Pitakarnnop, R.W. (2014) Rarefied Gas Flow in Pressure and Vacuum Measurements. ACTA IMEKO, 3, 60-63.

[17]   Pfeiffer Vacuum GmbH (2009) Vacuum Technology—Know How.

[18]   Hassan, J.M., Mohamed, T.A., Mohammed, W.S. and Alawee, W.H. (2014) Modeling the Uniformity of Manifold with Various Configurations. Journal of Fluids, 11, 1-8.