JMP  Vol.2 No.9 , September 2011
The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition
ABSTRACT
In this work we report the measurement of the self-bias voltage of radiofrequency (RF) capacitevely coupled plasma, with a multihollow cathode and methane precursor, used for amorphous hydrogenated carbon (a- C:H) thin film deposition. The plasma is produced in the incident power and pressure ranges between 20 - 300 W and 10 - 100 mTorr, respectively. It was found that the self-bias voltage Vdc is a linear function of the square root of the incident power WRF. The relationship between the self-bias voltage and gas pressure P is established; this gives an empirical relation for (p/p0)y . From this result, the pressure p0 corresponding to the transition from hollow cathode effect to hollow cathode arc effect is determined.

Cite this paper
nullS. Djerourou, K. Henda and M. Djebli, "The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition," Journal of Modern Physics, Vol. 2 No. 9, 2011, pp. 954-957. doi: 10.4236/jmp.2011.29113.
References
[1]   K. Luo, Y. Q. Fu, H. R. Le, J. A. Williams, S. M. Spear-ing and W. I. Milne “Diamonde and Diamonde-Like Carbon MEMS,” Journal of Micromechanics and Mi-croengineering, Vol. 17, No. 1, June 2007, pp. S147-S163. doi:10.1088/0960-1317/17/7/S12

[2]   A. Tibrewala, E. Peiner, R. Bandorf, S. Biehl and H. Lüthje, “The Piezoresistive Effect in Diamonde-Like Carbon Films,” Journal of Micromechanics and Micro-engineering, Vol. 17, No. 7, June 2007, pp. S77-S82. doi:10.1088/0960-1317/17/7/S03

[3]   R. Hauert, “Tribology of Diamond-Like Carbon Films: Fundamentals and Applications,” Springer, New York, 2008.

[4]   S. Tinchev, P. Nikolova, S. Balabanov and N. Georgiev, “Amorphous Hydrogenated Carbon Coating for Thermal Solar Collectors,” Journal of Physics: Conference Sries, Vol. 113, 2008, p. 1.

[5]   E. Peiner, A. Tibrewala, R. Bandorf, H. Lüthje, L. Doering and W. Limmer, “Diamond-Like Carbon for MEMS,” Journal of Micromechanics and Microengineering, Vol. 17, No. 7, June 2007, pp. S83-S90. doi:10.1088/0960-1317/17/7/S04

[6]   W. I. Milne, “Electronic Device from Diamonde-Like Carbon,” Semiconductor Science and Technology, Vol. 18, February 2003, pp. S81-S85. doi:10.1088/0268-1242/18/3/312

[7]   E. Neyts, A. Bogaerts and M. C. M. van de Sanden, “Reaction Mechanisms and Thin a-C:H Film Growth from Low Energy Hydrocarbon Radicals,” Journal of Physics: Conference Series, Vol. 86, No. 1, 2007, pp. 1-15.

[8]   P. Wang, X. Wang, W. M. Liu and J. Y. Zhang, “Growth and Structure of Hydrogenated Carbon Films Containing Fullerene-Like Structure,” Journal of Physics D: Applied Physics, Vol. 41, No. 8, March 2008, pp. 1-7. doi:10.1088/0022-3727/41/8/085401

[9]   G. Romyani, J. Tapati and R. Swati, “Transparent Polymer and Diamond-Like Hydrogenated Amorphous Carbon Thinfilms by PECVD Technique,” Journal of Physics D: Applied Physics, Vol. 41, No. 15, July 2008, pp. 1-7.

[10]   F. Zhao, H. X. Li, L. Ji, Y. F. Mo, W. L. Quan, H. D. Zhou and J. M. Chen, “Structural, Mechanical and Tri-bological Characterizations of a-C:H:Si Films Prepared by Hybrid PECVD and Sputtering Technique,” Journal of Physics D: Applied Physics, Vol. 42, No. 16, July 2009, pp. 1-13. doi:10.1088/0022-3727/42/16/165407

[11]   N. M. S. Marins, R. P. Mota, D. C. R. Santos, R. Y. Honda, M. E. Kayama, K. G. Kostov, M. A. Algatti, N. C. Cruz and E. C Rangel, “Amorphous Hydrogenated Carbon Films Treated by SF6 Plasma,” Journal of Physics: Conference Series, Vol. 167, No. 1, 2009, pp. 1-4.

[12]   L. Gabriel, “Influence of the Substrate-Electrode Applied Bias Voltage on the Properties of Sputtered a-C:H Thin Films,” Journal of Physics: Condensed Matter, Vol. 13, No. 13, 2001, pp. 3011-3021. doi:10.1088/0953-8984/13/13/314

[13]   H. águas, R. Martins and E. Fortunato, “Plasma Dianos-tics of a PECVD System Using Different R.F. Elec Trode Configurations,” Vacuum, Vol. 56, No. 1, January 2000, pp. 31- 37.

[14]   K. Sommeri, A. P. Thorne and R. C. M. Learner, “An Active Filter for Inert Gas Lines in a Hollow Cathode Light Source,” Journal of Physics D: Applied Physics, Vol. 16, No. 3, 1983, pp. 233-244. doi:10.1088/0022-3727/16/3/006

[15]   D. Mihailova, J. van Dijk, M. Grozeva, G. J. M. Hagelaar and J. J. A. M. van der Mullen, “A Hollow Cathode Dis-charge for Laser Applications: Influence of the Cathode Length,” Journal of Physics D: Applied Physics, Vol. 43, No. 14, March 2010, pp. 1-9. doi:10.1088/0022-3727/43/14/145203

[16]   A. Von Engel, “Ionized Gases,” Clarendon, Oxford, 1955.

[17]   K. Yambe, “Property of Plasma by Radio Frequency Discharge with the Us of Multi Hollow Cathods,” Journal of Physics: Conference Series, Vol. 106, 2008, pp. 1-5.

[18]   Y. Ohtsu and H. Fujita, “Production of High-Density Capacitive Plasma by the Effect of Multihollow Cathode Discharge and High-Secondary-Electron Emission,” Ap-plied Physics Letters, Vol. 92, No. 17, April 2008, pp. 1-3.

[19]   A. Pastol and Y. Catherine, “Optical Emission Spectros-copy for Diagnostic and Monitoring of CH4 Plasmas Used for a-C:H Deposition,” Journal of Physics D: Ap-plied Physics, Vol. 23, No. 7, 1990, pp. 799-805. doi:10.1088/0022-3727/23/7/008

[20]   Y. Catherine and P. Couderc, “Electrical Characteristics and Growth Kinetics in Discharges Used for Plasma Depo Sition of Amorphous Carbon,” Thin Solid Films, Vol. 144, No. 2, 1986, pp. 265-280. doi:10.1016/0040-6090(86)90419-0

[21]   C. Riccardi, R. Barni, M. Fontanesi, B. Marcandalli, M. Massafra, E. Selli and G. Mazzone, “A SF6 RF Plasma Reactor for Research on Textile Treatment,” Plasma Sources Science and Technology, Vol. 10, No. 1, 2001, pp. 92-98. doi:10.1088/0963-0252/10/1/312

[22]   S. Peter, K. Graupner, D. Grambole and F. Richter, “Comparative Experimental Analysis of the a-C:H Depo-sition Processes Using CH4 and C2H2 as Precursors,” Journal of Applied Physics, Vol. 102, No. 5, 2007, pp. 1-18. doi:10.1063/1.2777643

[23]   E. Oks, “Plasma Cathode Electron Sources: Physics, Technology, Applications,” Wiley-Vch Verlag GmbH & Co.KGaA, Weinheim, 2006.

[24]   H. Barankova, “Proc. Inte.r Sym. on Thin Film Materials, Processes, Reliability, and Applications: Thin Film Processes,” Electrochemical Society Inc, Pennington, 1998.

 
 
Top