ABSTRACT In this work we report the measurement of the self-bias voltage of radiofrequency (RF) capacitevely coupled plasma, with a multihollow cathode and methane precursor, used for amorphous hydrogenated carbon (a- C:H) thin film deposition. The plasma is produced in the incident power and pressure ranges between 20 - 300 W and 10 - 100 mTorr, respectively. It was found that the self-bias voltage Vdc is a linear function of the square root of the incident power WRF. The relationship between the self-bias voltage and gas pressure P is established; this gives an empirical relation for (p/p0)y . From this result, the pressure p0 corresponding to the transition from hollow cathode effect to hollow cathode arc effect is determined.
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