JMP  Vol.2 No.9 , September 2011
The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition
In this work we report the measurement of the self-bias voltage of radiofrequency (RF) capacitevely coupled plasma, with a multihollow cathode and methane precursor, used for amorphous hydrogenated carbon (a- C:H) thin film deposition. The plasma is produced in the incident power and pressure ranges between 20 - 300 W and 10 - 100 mTorr, respectively. It was found that the self-bias voltage Vdc is a linear function of the square root of the incident power WRF. The relationship between the self-bias voltage and gas pressure P is established; this gives an empirical relation for (p/p0)y . From this result, the pressure p0 corresponding to the transition from hollow cathode effect to hollow cathode arc effect is determined.

Cite this paper
nullS. Djerourou, K. Henda and M. Djebli, "The Effect of a Multihollow Cathode on the Self-Bias Voltage of Methane RF Discharge Used for a-C:H Deposition," Journal of Modern Physics, Vol. 2 No. 9, 2011, pp. 954-957. doi: 10.4236/jmp.2011.29113.
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