The gas barrier film formation technique using simultaneous photo-irradiation and heat-treatment has been researched on alicyclic polyimide film coated with a polysilazane solution. A fine SiO2 thin film on polyimide film was formed at low temperatures, which greatly improved the substrate’s gas barrier characteristics by this technique. The values of gas barrier characteristics depended on the substrate temperature at the time of photo-irradiation. For photo-irradiated thin film heat-treated to 150°C, the water vapor transmission rate and oxygen transmission rate fell below the equipment measurement limit of 0.02 g/m2/day and 0.02 cm3/m2/day, respectively. This polyimide film with a gas-barrier film coating has good transmittance in the region of visible light, heat resistance, and flexibility.
Cite this paper
Ohishi, T. , Sone, S. and Yanagida, K. (2014) Preparation and Gas Barrier Characteristics of Polysilazane-Derived Silica Thin Films Using Ultraviolet Irradiation. Materials Sciences and Applications
, 105-111. doi: 10.4236/msa.2014.53015
 Brinker, C. J. and Scherer, G.W. (1990) Sol-Gel Science. Academic Press, Boston.
 Seyferth, D. and Wiseman, G.H. (1984) High-Yield Synthesis of Si3N4/SiC Ceramic Materials by Pyrolysis of a Novel Polyorganosilazane. Journal of the American Ceramic Society, 67, C132-C133.
 Taga, Y. and Akashi, K. (2007) Passivation Films on Organic Film Substrates Designed for Organic Electroluminescence Device. The Journal of the Vacuum Society of Japan, 50, 735-738. http://dx.doi.org/10.3131/jvsj.50.735
 Kamiya, K., Tange, T., Hashimoto, T., Nasu, H. and Shimizu, Y. (2001) Formation Process of Silica Glass Thin Films from Perhydropolysilazane. Research Reports of the Faculty of Engineering, Mie University, 26, 23-31.
 Kubo, T., Tadaoka, E. and Kozuka, H. (2004) Formation of Silica Coating Films from Spin-On Polysulazane at Room Temperature and Their Stability in Hot Water. Journal of Materials Research, 19, 635-642. http://dx.doi.org/10.1557/jmr.2004.19.2.635
 Kubo, T., Tadaoka, E. and Kozuka, H. (2004) Preparation of Hot Water-Resistant Silica Thin Films from Polysilazane Solution at Room Temperature. Journal of Sol-Gel Science and Technology, 31, 257-261. http://dx.doi.org/10.1023/B:JSST.0000047999.87439.c2
 Kubo, T. and Kozuka, H. (2006) Conversion of Perhydropolysilazane-to-Silica Thin Films by Exposure to Vapor from Aqueous Ammonia at Room Temperature. Journal of the Ceramic Society of Japan, 114, 517-523. http://dx.doi.org/10.2109/jcersj.114.517
 Ohishi, T. (2003) Gas Barrier Characteristics of a Polysilazane Film Formed on an ITO-Coated PET Substrate. Journal of Non-Crystalline Solids, 330, 248-251. http://dx.doi.org/10.1016/j.jnoncrysol.2003.09.022
 Naganuma, Y., Tanaka, S., Kato, C. and Shindo, T. (2004) Formation of Silica Coating from Perhydropolysilazane Using Vacuum Ultraviolet Excimer Lamp. Journal of the Ceramic Society of Japan, 112, 599-603. http://dx.doi.org/10.2109/jcersj.112.599
 Prager, L., Dierdorf, G., Liebe, H., Naumov, S., Stojanovic’, S., Heller, R., Wennrich, L. and Buchmeiser, M.R. (2007) Conversion of Perhyropolysilazane into SiOx Network Triggered by Vacuum Ultraviolet Irradiation. Chemistry—A European Journal, 13, 8522-8529. http://dx.doi.org/10.1002/chem.200700351
 Kobayashi, Y., Yokota, H., Fuchita, Y., Takahashi, A. and Sugawara, Y. (2013) Characterization of Gas Barrier Silica Coating Prepared from Perhydropolysilazane Films by Vacuum Ultraviolet Irradiation. Journal of the Ceramic Society of Japan, 121, 215-218. http://dx.doi.org/10.2109/jcersj2.121.215
 Lide, D.R. (1992) Handbook of Chemistry and Physics. 72nd Edition, CRC, Boca Raton.