MNSMS  Vol.4 No.1 , January 2014
Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor
Author(s) Simon Kibben*
ABSTRACT
An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.

Cite this paper
S. Kibben, "Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor," Modeling and Numerical Simulation of Material Science, Vol. 4 No. 1, 2014, pp. 14-19. doi: 10.4236/mnsms.2014.41003.
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