UV-curable perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen atmospheres. Photo-DSC analysis revealed that N2 purging and the presence of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable free-radical PFPE-DMA/ HDDA system. In addition, TEA synergistically acted as a coinitiator or photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The results presented here demonstrate that investigating the photocuring behaviors of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA fluoropolymer.
 M. Yamabe, “A Challenge to Novel Fluoropolymers,” Makromolekulare Chemie. Macromolecular Symposia, Vol. 64, No. 1, 1992, pp. 11-18.
 S. Turri, A. Sanguineti and R. Lecchi, “Novel Glass Fiber-Reinforced Composites Having a UV and Peroxy Curable Fluoropolymer Matrix,” Macromolecular Materials and Engineering, Vol. 288, No. 9, 2003, pp. 708-716.
 H. Lorenz, M. Despont, N. Fahrni, J. Brugger, P. Vettiger and P. Renaud, “High-Aspect-Ratio, Ultrathick, Negative-Tone Near-UV Photoresist and Its Applications for MEMS,” Sensors and Actuators A: Physical, Vol. 64, No. 1, 1998, pp. 33-39.
 J. A. Rogers and H. H. Lee, “Unconventional Nanopatterning Techniques and Applications,” Wiley, New York, 2008. http://dx.doi.org/10.1002/9780470405789
 J. Taniguchi, H. Ito, J. Mizuno and T. Saito, “Nanoimprint Technology: Nanotransfer for Thermoplastic and Photocurable Polymers,” Wiley, New York, 2013.
 R. Bongiovanni, N. Pollicino, G. Gozzelino, G. Malucelli, A. Priola and B. Ameduri, “Surface Properties of Networks Containing Fluorinated Acrylic Monomers,” Polymers for Advanced Technologies, Vol. 7, No. 5-6, 1996, pp. 403-408.
 A. Priola, R. Bongiovanni, G. Malucelli, A. Pollicino, C. Tonelli and G. Simeone, “UV-curable Systems Containing Perfluoropolyether Structures: Synthesis and Characterisation,” Macromolecular Chemistry and Physics, Vol. 198, No. 6, 1997, pp. 1893-1907.
 B. Ameduri, R. Bongiovanni, G. Malucelli, A. Pollicino and A. Priola, “New Fluorinated Acrylic Monomers for the Surface Modification of UV-Curable Systems,” Journal of Polymer Science Part A: Polymer Chemistry, Vol. 37, No. 1, 1999, pp. 77-87.
 F. Y. C. Boey and W. Qiang, “Experimental Modeling of the Cure Kinetics of an Epoxy-Hexaanhydro-4-Methylph- thalicanhydride (MHHPA) System,” Polymer, Vol. 41, No. 6, 2000, pp. 2081-2094.
 J. D. Cho, H. T. Ju and J. W. Hong, “Photocuring Kinetics of UV-Initiated Free-Radical Photopolymerizations with and without Silica Nanoparticles,” Journal of Polymer Science Part A: Polymer Chemistry, Vol. 43, No. 3, 2005, pp. 658-670. http://dx.doi.org/10.1002/pola.20529
 J. D. Cho, H. T. Ju, Y. S. Park and J. W. Hong, “Kinetics of Cationic Photopolymerizations of UV-Curable Epoxy-Based SU8-Negative Photoresists with and without Silica Nanoparticles,” Macromolecular Materials and Engineering, Vol. 291, No. 9, 2006, pp. 1155-1163.
 C. Decker, T. N. T. Viet, D. Decker and E. Weber-Koehl, “UV-Radiation Curing of Acrylate/Epoxide Systems,” Polymer, Vol. 42, No. 13, 2001, pp. 5531-5541.
 S. C. Clark, C. E. Hoyle, S. Jonsson, F. Morel and C. Decker, “Photopolymerization of Acrylates Using N-aliphaticmaleimides as Photoinitiators,” Polymer, Vol. 40, No. 18, 1999, pp. 5063-5072.
 B. K. Kim, Y. H. Cho and J. S. Lee, “Effect of Polymer Structure on the Morphology and Electro-Optic Properties of UV Curable PNLCs,” Polymer, Vol. 41, No. 4, 2000, pp. 1325-1335.
 J. D. Cho, S. T. Han and J. W. Hong, “A Novel in Situ Relative-Conductivity-Based Technique for Monitoring the Cure Process of UV-Curable Polymers,” Polymer Testing, Vol. 26, No. 1, 2007, pp. 71-76.
 O. Yaroshchuk, F. Elouali and U. Maschke, “Control of Phase Separation and Morphology of Thiol-Ene Based PDLCs by Curing Light Intensity,” Optical Materials, Vol. 32, No. 9, 2010, pp. 982-989.