Two optical methods, namely crystal
facet reflection and etching pits reflection, were used to orient <100>
and <111> high-purity germanium crystals. The X-ray diffraction patterns
of three slices that were cut from the oriented <100> and <111>
crystals were measured by X-ray diffraction. The experimental errors of crystal
facet reflection method and etching pits reflection method are in the range of 0.05° - 0.12°. The crystal facet reflection
method and etching pits reflection method are extremely simple and cheap and
their accuracies are acceptable for characterizing high purity detector-grade
Cite this paper
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