OJSTA  Vol.2 No.2 , April 2013
New Method for Synthesis of Coatings of Molybdenum, Tungsten, Their Carbides and Composites
ABSTRACT

In this paper we report, for the first time, a new approach for synthesis of high quality faceted microcrystalline coatings of molybdenum (Mo), tungsten (W), their carbides and composites. These studies are carried out using Hot Filament Chemical Vapor Deposition (HF-CVD) method wherein parent materials (Mo and/or W) are taken in the form of wires (~0.5 mmdia) and are heated to a high temperature (TF ~ 1500 - 2000 C), in ambient of oxygen (O2) diluted hydrogen (H2) gas. Due to high filament temperature (TF), a series of pyrolytic reactions take place. Firstly, the gasification of wire material (Mo and/or W) occurs in the form of its oxide. The oxide molecules reach the substrate which is kept underneath the filament assembly. Secondly, molecular hydrogen gets dissociated into atomic hydrogen and subsequently reaches the substrate to react with oxide molecules, finally leading to the precipitation of a pure metal. This method can also be used, in situ, to convert metallic coatings into their carbides and/or composites. The method offers many other attractive features, which can not be rendered by the conventionalCVD/PVDmethods. The results are discussed in terms of temperature induced “Red-ox” reactions.


Cite this paper
R. Godbole, M. More, A. Gupte and V. Godbole, "New Method for Synthesis of Coatings of Molybdenum, Tungsten, Their Carbides and Composites," Open Journal of Synthesis Theory and Applications, Vol. 2 No. 2, 2013, pp. 78-85. doi: 10.4236/ojsta.2013.22010.
References
[1]   D. R. Linde, “Handbook of Chemistry and Physics,” 78th Edition, CRC Press, New York, 1998, pp. 12-144, 12-192-194.

[2]   E. Lassner and W.-D. Schubert “Tungsten: Properties, Chemistry, and Technology of the Element, Alloys, and Chemical Compounds,” Springer, Berlin, 1999, pp. 86, 114-118.

[3]   C. K Gupta, “Extractive Metallurgy of Molybdenum,” 1st Edition, CRC Press, New York, 1992.

[4]   C. Porosnicu1, M. Osiac, E. Osiac and C. P. Lungu, Physics AUC, Vol. 20, Pt. 1, 2010, pp. 57-63.

[5]   I. Smid, M. Akiba, G. Vieider and L. Plochl, “Development of Tungsten Armor and Bonding to Copper for PlasmaInteractive Components,” Journal of Nuclear Materials, Vol. 258-263, Pt. 1, 1998, pp. 160-172.

[6]   K. M. Chang, T. H. Yeh, I. C. Deng and C. W. Shih, “Amorphouslike Chemical Vapor Deposited Tungsten Diffusion Barrier for Copper Metallization and Effects of Nitrogen Addition,” Journal of Applied Physics, Vol. 82, No. 3, 1997, pp. 1469-1475. doi:10.1063/1.365925

[7]   J. S. Becker and R. G. Gordon, “Diffusion Barrier Properties of Tungsten Nitride Films Grown by Atomic Layer Deposition from Bis(Tert-Butylimido)Bis(Dimethylamido) Tungsten and Ammonia,” Applied Physics Letters, Vol. 82, No. 14, 2003, 7 Pages. doi:10.1063/1.1565699

[8]   N. P. Padture, et al., “Towards Durable Thermal Barrier Coatings with Novel Microstructures Deposited by Solution-Precursor Plasma Spray,” Acta Materialia, Vol. 49, No. 12, 2001, pp. 2251-2257. doi:10.1016/S1359-6454(01)00130-6

[9]   M. Tabbal, M. Meunier, R. Izquierdo, B. Beau and A. Yelon, “Laser-Chemical Vapor Deposition of W Schottky Contacts on GaAs Using WF6 and SiH4,” Journal of Applied Physics, Vol. 81, No. 10, 1997, pp. 6607-6611. doi:10.1063/1.365199

[10]   K. M. Chang, T. H. Yeh, I. C. Deng and C. W. Shih, “Amorphouslike Chemical Vapor Deposited Tungsten Diffusion Barrier for Copper Metallization and Effects of Nitrogen Addition,” Journal of Applied Physics, Vol. 82, No. 3, 1997, pp. 1469-1475. doi:10.1063/1.365925

[11]   K. Aryal, H. Khatri, R. W. Collins and S. Marsillac, “In Situ and ex Situ Studies of Molybdenum Thin Films Deposited by rf and dc Magnetron Sputtering as a Back Contact for CIGS Solar Cells,” International Journal of Photo Energy, Vol. 2012, 2012, Article ID: 723714, 7 Pages.

[12]   A. A. Rouse, J. B. Bemhard, E. D. Sosa and D. E. Golden, “Field Emission from Molybdenum Carbide,” Applied Physics Letters, Vol. 76, No. 18, 2000, pp. 2583-2585. doi:10.1063/1.126415

[13]   E. Weigert, M. Humbert, Z. J. Mellinger, Q. Ren, T. P. Beebe, L. Bao and J. Chen, “Physical Vapor Deposition Synthesis of Tungsten Monocarbide (WC) Thin Films on Different Carbon Substrates,” Journal of Vacuum Science and Technology, Vol. 26, No. 1, 2008, pp. 23-28. doi:10.1116/1.2806941

[14]   V. Fox, J. Hampshire and D. Teer, “MoS2/Metal Composite Coatings Deposited by Closed-Field Unbalanced Magnetron Sputtering: Tribological Properties and Industrial Uses,” Surface Coating Technology, Vol. 112, No. 1-3, 1999, pp. 118-122. doi:10.1016/S0257-8972(98)00798-1

[15]   O. Smorygo, S. Voronin, P. Bertrand and I. Smurov, “Fabrication of Thick Molybdenum Disulphide Coatings by Thermal-Diffusion Synthesis,” Tribology Letters, Vol. 17, No. 4, 2004, pp. 723-726. doi:10.1007/s11249-004-8079-8

[16]   H. Zhang and D. Y. Li, “Effects of Sputtering Condition on Tribological Properties of Tungsten Coatings,” Wear, Vol. 255, No. 7, 2003, pp. 924-932.

[17]   P. S. Pokhre, C. Simion, V. Teodorescu, N. Barsan and U. Weimar, “Synthesis, Mechanism, and Gas-Sensing Application of Surfactant Tailored Tungsten Oxide Nanostructures,” Advanced Functional Materials, Vol. 19, No. 11, 2009, pp. 1767-1774. doi:10.1002/adfm.200801171

[18]   Y. Djaoued, S. Balaji and R. Brüning, “Electrochromic Devices Based on Porous Tungsten Oxide Thin Films,” Journal of Nanomaterials, Vol. 2012, 2012, Article ID: 674168, 9 Pages.

[19]   C. A. Ellefson, O. Marin-Flores, S. Ha and M. G. Norton, “Synthesis and Applications of Molybdenum (IV) Oxide,” Journal of Materials Science, Vol. 47, No. 5, 2012, pp. 2057-2071.

[20]   R. F. Davis, “Diamond Films and Coatings,” Noyes Publications, New Jersey, 1993.

[21]   K. E. Spear and J. P. Dismukes, “Synthetic Diamond: Emerging CVD Science and Technology,” A Wiley-Interscience Publication, John Wiley & Sons, Inc., New York, 1994.

[22]   International Center for Diffraction Data (PCPDFWIN), “v 1.3, JCPDS-Card nos. 04-0806 (for W), 42-1120 (for Mo), 45-0167 for WO3-x, 41-0905 for WO3, 47-1319 for β-W, 25-1047 (for WC), 35-0787 (for α-Mo2C) and 35-0776 (for α-W2C),” 1997.

[23]   V. P. Godbole, R. J. Narayan, X. Zu, J. Narayan and J. Sankar, “Diamond Films and Composites on Cobalt— Chromium Alloys,” Material Science and Engineering: B, Vol. 58, No. 3, 1999, pp. 251-257. doi:10.1016/S0921-5107(98)00430-9

[24]   V. P. Godbole, K. Jagannadhem and J. Narayan, “Nucleation and Growth of Diamond Films on Aluminum Nitride Coated Nickel,” Applied Physics Letters, Vol. 67, No. 9, 1995, pp. 1322-1324. doi:10.1063/1.114527

[25]   V. P. Godbole and J. Narayan, “Synthesis of Diamond Films on Hastelloy,” Journal of Material Research, Vol. 7, No. 10, 1992, pp. 2758-2790. doi:10.1557/JMR.1992.2785

[26]   V. P. Godbole and J. Narayan, “Nucleation and Growth of Diamond on FeSi2/Si Substrates by Hot Filament Chemical Vapor Deposition,” Journal of Applied Physics, Vol. 71, No. 10, 1992, pp. 4944-4948. doi:10.1063/1.351380

[27]   J. Narayan, V. P. Godbole, G. Matera and R. K. Singh, Journal of Applied Physics, Vol. 71, No. 2.

 
 
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