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Crystal Structure Theory and Applications
ISSN Online: 2169-2505
Google-based IF: 0.44  Citations h5-index & Ranking*
Submission
Volume 10, Number 3 , August 2021
Cover Page, Table of Contents and Others: PDF (6800kb)
Effect of Chamber Conditions and Substrate Type on PECVD of SiGeSn Films
Venkat Hariharan, Jignesh Vanjaria, Arul Chakkaravarthi Arjunan, Gary S. Tompa, Hongbin Yu

Cryst. Struct. Theory Appl. Vol.10 No.3, August 30, 2021
DOI:10.4236/csta.2021.103004

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