Professor Te-Hua Fang

Department of Mechanical Engineering

National Kaohsiung University of Applied Sciences (KUAS), Chinese Taipei




1997–2000  Ph.D., Department of Mechanical Engineering, National Cheng Kung University, Chines Taipei

1993–1995  M.Sc., Department of Mechanical Engineering, National Cheng Kung University, Chinese Taipei

1991–1993  B.Sc., Department of Mechanical Engineering, National Taiwan Institute of Technology, Chinese Taipeil


  1. C.D. Wu, T.H. Fang, C.Y. Chan (2011) A molecular dynamics simulation of the mechanical characteristics of a C60-filled carbon nanotube under nanoindentation using various carbon nanotube tips. Carbon, 49, 2053-2061.
  2. C.D. Wu, T.H. Fang, J.F. Lin (2010) Formation mechanism and mechanics of dip-pen nanolithography using molecular dynamics. Langmuir, 26 (5), 3237–3241.
  3. T. H. Fang, S.H. Kang (2010) Preparation and Characterization of Mg-doped ZnO Nanorods. Journal of Alloys and Compounds, 492, 536-542.
  4. T. H. Fang, W.Y. Chang, J. J. Huang (2009) Dynamic characteristics of nanoindentation using atomistic simulation. Acta Materialia, 57, 3341-3348.
  5. Z.H. Hong, S.F. Hwang, T.H. Fang (2008) Atomic-level stress calculation and two potentials of critical conditions of deposition process. Crystal Growth & Design, 8, 949-958.
  6. T.H. Fang, Y.J. Hsiao, Y.S. Chang, L.W. Ji, S. H. Kang (2008) Luminescent and structural properties of MgNb2O6 nanocrystals. Current Opinion in Solid State & Materials Science, 12, 51-54.
  7. L. W. Ji, S. J. Young, T. H. Fang, C. H. Liu (2007) Buckling characterization of vertical ZnO nanowires using nanoindentation. Applied Physics Letters, 90, 033109.
  8. S. J. Young, L. W. Ji, T. H. Fang, S. J. Chang, Y. K. Su, X. L. Du (2007) ZnO ultraviolet photodiodes with Pd contact electrodes. Acta Materialia, 55, 329-333.
  9. T. H. Fang, C I Weng (2000) Three-dimensional molecular dynamics analysis of processing using a pin tool on the atomic scale. Nanotechnology, 11, 148-153.
  10. T. H. Fang, C I Weng, J G Chang (2000) Machining characterization of nano-lithography process by using atomic force microscopy. Nanotechnology,. 11,181-187.